Polarity dependent properties of GaN layers grown by hydride vapor phase epitaxy on GaN bulk crystals

نویسندگان

  • F. Tuomisto
  • T. Suski
  • H. Teisseyre
  • M. Krysko
  • M. Leszczynski
  • B. Lucznik
  • S. Porowski
  • D. Wasik
  • A. Witowski
  • W. Gebicki
  • P. Hageman
  • K. Saarinen
چکیده

F. Tuomisto; 1; 5, T. Suski1, H. Teisseyre1, M. Krysko1, M. Leszczynski1, B. Lucznik1, I. Grzegory1, S. Porowski1, D. Wasik2, A. Witowski2, W. Gebicki3, P. Hageman4, and K. Saarinen5 1 High Pressure Research Center, Unipress, Polish Academy of Sciences, 01-142 Warsaw, Poland 2 Institute of Experimental Physics, Warsaw University, Hoza 69, Warsaw, Poland 3 Warsaw University of Technology, Koszykowa 75, 00-662 Warsaw, Poland 4 NSRIM, University of Nijmegen, Toernooiveld 1, 6525 ED, Nijmegen, The Netherlands 5 Laboratory of Physics, Helsinki University of Technology, P.O. Box 1100, 02015 HUT, Finland

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Hydride Vapor Phase Epitaxial Growth of Thick GaN Layers with Improved Surface Flatness

Thick GaN layers have been grown by hydride vapor phase epitaxy (HVPE) on different GaN templates grown by metalorganic vapor phase epitaxy. Crack formation could be reduced by using a hydrogen/nitrogen carrier gas mixture. By carefully optimizing the growth conditions in the final stage of the process, excellent surface morphologies could be obtained at still acceptably high growth rates. Up t...

متن کامل

EXTENDED DEFECTS AND POLARITY OF HYDRIDE VAPOR PHASE EPITAXY GaN

Hydride vapor phase epitaxy (HVPE) GaN layers on sapphire substrates and so-called free-standing platelets (layers removed from the sapphire) were studied by different transmission electron microscopy (TEM) techniques. Polarity determined by convergent beam electron diffraction (CBED) and distribution of structural defects, determined by conventional TEM, are discussed. HVPE layers were found t...

متن کامل

Optimizing Structured SiN-masks for Self Separation of Full 2”-GaN Wafers by Hydride Vapor Phase Epitaxy

Using a previously shown method, we prepared 2”-GaN wafers as templates for a self separation process. Self separation is happening during cooldown after growing thick layers of GaN in our hydride vapor phase epitaxy (HVPE) reactor. Our templates consist of GaN grown by metalorganic vapor phase epitaxy (MOVPE) directly on sapphire. These GaN layers are masked with 200nm of SiN that are structur...

متن کامل

Orientation Control of Bulk GaN Substrates Grown via Hydride Vapor Phase Epitaxy

The growth of GaN bulk crystals via the HVPE process and the manufacturing of orientation controlled substrates from the GaN crystals are presented. An HVPE process has been produced for growth of bulk GaN on sapphire with an AlN interfacial seed layer. This process has allowed for the production of GaN substrates up to 2 inches in diameter. Due to the stress associated with the growth of GaN o...

متن کامل

Enhancing GaN Self Separation in HVPE by Use of Molybdenum

We prepared 2”-GaN wafers as templates for a self separation process which is happening during cooldown after growing thick layers of GaN in our hydride vapor phase epitaxy (HVPE) reactor. Our templates process starts with GaN grown by metalorganic vapor phase epitaxy (MOVPE) directly on sapphire. These GaN layers are getting masked with 200nm of SiN that is structured by means of optical litho...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2003